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Hard Si-C-N chemical vapor deposited films

O.Porada,
 
A.Kozak,
 
V.Ivaschenko,
 
S.N.Dub,
 
A.Pogrebnjak
 

I. M. Frantsevich Institute for Problems of Materials Science of the NAS of Ukraine, Omeliana Pritsaka str.,3, Kyiv, 03142, Ukraine
Proceedings of the International Conference “Nanomaterials: Applications and Properties”, Lviv, Ukraine, September 16-23, 2015, 2015, Т.4, #1
http://www.materials.kiev.ua/article/1650

Abstract

Nb-Al-N films were deposited by magnetron sputtering of the Nb and Al targets in the Ar-N2 atmosphere on silicon wafers at various currents supplied to the magnetron device with the Al target (IAl=100, 150, 200, 300 mA). The films were studied with XRD, FTIR spectroscopy, as well by nanoindentation and Knoop indentation tests. The films were found to have the nanocomposite nc-B1-NbNx/a-AlN structure and exhibit the nanohardness and Knoop hardness in the ranges of 29-33.5 GPa and 46-48 GPa, respectively. The hardness and elastic modulus has an extreme dependence on IAl


ALN FILMS, FILM STRUCTURE, MAGNETRON SPUTTERING, MECHANICAL PROPERTIES, NANOINDENTATION, NB-AL-N FILMS

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