Analisis of the Influence of Deposition Condition on the Structure of the Coatings Nb-Al-N

  
В.Н.Рогоз,
 
А.І.Купчишин,
 
P.Weigierek
 

Інститут проблем матеріалознавства ім. І. М. Францевича НАН України , вул. Омеляна Пріцака, 3, Київ, 03142, Україна
«Nanomaterials: Applications and Properties», Lviv, Ukraine, September 16-23, 2015., 2015, Т.4, #1
http://www.materials.kiev.ua/article/1652

Анотація

Nb-Al-N films were deposited by magnetron sputtering of the Nb and Al targets in the Ar-N2 atmosphere on silicon wafers at various currents supplied to the magnetron device with the Al target (IAl=100, 150, 200, 300 mA). The films were studied with XRD, FTIR spectroscopy, as well by nanoindentation and Knoop indentation tests. The films were found to have the nanocomposite nc-B1-NbNx/a-AlN structure and exhibit the nanohardness and Knoop hardness in the ranges of 29-33.5 GPa and 46-48 GPa, respectively. The hardness and elastic modulus has an extreme dependence on IAl Keywords: Nb-Al-N films; AlN films; Magnetron sputtering; Film structure; Mechanical properties


ALN ПЛІВКИ, NB-AL-N ПЛІВКИ, МАГНЕТРОННЕ РОЗПИЛЕННЯ, МЕХАНІЧНІ ВЛАСТИВОСТІ, СТРУКТУРА ПЛІВКИ