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  4. № 05/06 2008
  5. P. 84

LASER TREATMENT OF CAPACITANCE-RESISTANCE THICK-FILMS ON BASIS LaB6

† A.Paustovskiy,
 
B.Rud,
 
V.Sheludko,
 
E.Telnikov,
 
V.V.Kremeneckiy,
 
P.S.Smertenko,
 
I.V.ZakharchenkO,
 
A.Rogozinskaya
 

I. M. Frantsevich Institute for Problems of Materials Science of the NAS of Ukraine, Omeliana Pritsaka str.,3, Kyiv, 03142, Ukraine
Powder Metallurgy - Kiev: Frantsevich Institute for Problems of Materials Science NASU, 2008, #05/06
http://www.materials.kiev.ua/article/748

Abstract

The paper studies the effect of laser processing on the structure and electrophysical properties of LaB6-based thick film resistors (TFR). The phases and structure of the composi¬tion are investigated. The exposure to micro- and nanosecond pulses, unlike millisecond ones, is shown to insignificantly increase the electrical resistance of the film and to aid in forming more uniform and fine TFR structure. LaB6-based TFRs are more resistant to long-term exposure to nanosecond laser radiation than ВаВ6- and (ВаВ6-LaB6)-based ones.


ELECTROPHYSICAL PROPERTIES, LASER TREATMENT, STRUCTURE, THICK FILM RESISTOR (TFR)

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