Conferences

Kinetics of dispersion of niobium and hafnium nanofilms deposited onto oxygen-free inorganic materials which was a result of annealing them in vacuum

J.Naydich,
   
B.Kostyuk,
 
E. F.Kuzmenko
 

I. M. Frantsevich Institute for Problems of Materials Science of the NAS of Ukraine, Krzhizhanovsky str., 3, Kyiv, 03142, Ukraine
Adhesion of Melts and Brazing of Materials - Kiev: Frantsevich Institute for Problems of Materials Science NASU, 2012, #45
http://www.materials.kiev.ua/article/805

Abstract

Dispersion kinetics which is proceeds in niobium and hafnium nanofilms by thickness of 100 nm deposited onto oxygen-free inorganic materials as a result of them annealing in vacuum at temperatures 1200—1400 °С during various time (2—20 min) is investigated. It is established, that dispergation intensity of film—nonmetal joints at identical modes annealing is different. In nanofilms which were deposited onto ceramics on basis Si3N4 the certain structural changes are observed already after annealing at 1200 °C, and at temperature 1300 °C these films already are considerably dispergated while the films deposited onto carbon glass are changed only after annealing at 1400 °C.


ANNEALING, DISPERGATION, HAFNIUM NANOFILMS, KINETICS, NIOBIUM NANOFILMS, OXYGEN-FREE INORGANIC MATERIALS