Conferences

Kinetics of dispersion of chromium and nickel nanofilms deposited onto oxygen-free inorganic materials which was a result of annealing them in vacuum

J.Naydich,
   
B.Kostyuk,
 
S.I.Martynyuk,
 
T.B.Konovalenko
 

I. M. Frantsevich Institute for Problems of Materials Science of the NAS of Ukraine, Krzhizhanovsky str., 3, Kyiv, 03142, Ukraine
Adhesion of Melts and Brazing of Materials - Kiev: Frantsevich Institute for Problems of Materials Science NASU, 2014, #47
http://www.materials.kiev.ua/article/1748

Abstract

Dispersion kinetics which is proceeds in chromium and nickel nanofilms by thickness of 100 nm deposited onto oxygen-free inorganic materials as a result of them annealing in vacuum at temperatures 1000—1200 °С during various time (2—20 min) is investigated. It is established that both metal films onto carbon glass and Si3N4 ceramics are completely disintegrated at 1200 °С besides nickel film also interact with the substrate material. These films onto Si3N4 and carbon glass can be used for brazing at temperatures up to 1100 °C.


ANNEALING, CHROMIUM NANOFILM, DISPERGATION, KINETICS, NICKEL NANOFILMS, OXYGEN-FREE INORGANIC MATERIALS