Conferences

Characteristics of plasma-chemical coating deposited using hexamethyldisilazane

   
O.Butenko,
 
S.N.Dub,
 
P.M.Litvin,
 
V.A.Morozhenko,
 
A.O.Kozak
 

I. M. Frantsevich Institute for Problems of Materials Science of the NAS of Ukraine, Krzhizhanovsky str., 3, Kyiv, 03142, Ukraine
Nanostructural Material Science - Kiev: Frantsevich Institute for Problems of Materials Science NASU, 2011, #4
http://www.materials.kiev.ua/article/1632

Abstract

The SiCN films obtained by PECVD (plasma enhanced chemical vapor deposition) with hexamethyldisilazane (HMDSN) as a precursor were researched . The effect of additional nitrogen in the reaction chamber on the properties of the films was investigated. The films were characterized by using infrared spectroscopy and photoluminescence spectra. Also the mechanical properties of films, namely nanohargness and modulus of elasticity depending on the flow of nitrogen were studied.