Application of Rietveld method for the diffraction data analysis at the high-temperature ”іn – situ” investigation

Abstract

The main systematical experimental errors of the high-temperature X-Ray diffractometry, which effect on the positioning accuracy estimation and intensities of diffraction maximums, have been considered. The using of fullprofile analysis of the diffraction patterns have been proposed for taking into account the above mentioned factors. The software package for approximation of the diffraction patterns by the method of the direct search have been created