Mathematical model of spontaneous formation of layered condensates in electron-beam physical vapor deposition of a binary systems Cu—Mo (Cr)

Abstract

The kinetics of competitive crystal growth, their composition and size have been calculated for binary systems at electron beam physical vapor deposition as functions of evaporation rate of components, nucleation centers concentration and probability of nucleation appearance that was a function of current state of the process. On an example of the systems Cu—Mo (Cr) have been shown the proposed mechanism results in S-like dependence the concentration of a component on its part in total atom flux. It was shown the small fluctuation of pools temperature and self-oscillations that may generate at certain conditions are responsible for formation of layered structure of condensates. Using calculated structures was found dependence of resistivity of a layer on its composition that is in a good agreement with experiment and calculation with known empirical formulae.